Deposition

AJA ATC-ORION 8000 E-beam Evaporation System

E-beam Evaporation System

The AJA ATC-ORION 8000 E-beam evaporator is a performance UHV thin film deposition system. The system contains four material pockets for deposition of single—and multi-layer films without breaking the vacuum. The substrate holder can handle substrates up to 4 inches in diameter and allow simultaneous rotation. It can also be heated up to 850 °C in a suitable environment. A load-lock chamber allows quick removal and insertion of samples without venting the chamber. The quartz crystal thickness monitor ensures the precise control of the deposited film thickness.

Equipment Specification

  • UHV conditions (Base pressure: ~ 3·10-9 Torr)
  • 4 evaporation sources
  • Max wafer size: 100mm (4 inch)
  • Substrate rotation and heating (up to 850°C)
  • Quartz crystal thickness monitor

Documents

 

Current Targets Inside the System

Pocket Position

1

2

3

4

TargetTiSiO2AuCr
GroupHongXuHong and DowbenSinitskii