The Nanofabrication Cleanroom facility at NCMN aims to provide researchers with effective and efficient access to nanofabrication equipment, expertise, and training. Facility capabilities include high-resolution patterning by electron-beam lithography (EBL) and photolithography, focused ion beams (FIB), reactive ion etching (RIE) process, wet chemical etching, and optical, stylus, and electronic characterization tools. Research collaborations are welcome from all university research groups and companies in Nebraska and elsewhere.
Etching
- Wet etching bench
Metrology
- Reflective Film Thickness Measurement System (Filmetrics F40)
- Optic Microscope with camera (Nikon Eclipse L200N)
- Four-probe Resistivity Measurement Stand (Lucas 302)
Wafer Processing
- Spinner (Laurell WS-400-6NPP)
- Hot Plate (Super Nuova 120)
- Oven (Thermo Scientific 3492M)
- UltraSonic Cleaner (Brason 2510)