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The Nanofabrication Cleanroom facility at NCMN aims to provide researchers with effective and efficient access to nanofabrication equipment, expertise, and training. Facility capabilities include high-resolution patterning via electron-beam lithography (EBL) and photolithography, focused ion beam (FIB), reactive ion etching (RIE), wet chemical etching, and optical, stylus, and electronic characterization tools. Research collaborations are welcome from all university research groups and companies in Nebraska and elsewhere.
- Electron Beam Lithography (EBL) System
- Heidelberg DWL 66FS, laser lithography system
- SUSS MicroTec MJB4, mask aligner
- FEI Strata 200xp Focused-Ion Beam (FIB) Workstation
- Trion Minilock-Phantom III, reactive ion etching (RIE) system
- Oxford PlasmaPro 100, deep RIE system
- Intlvac Nanoquest-I, ion beam etching and milling system
- AJA ATC-ORION 8000, e-beam evaporation system
- Bruker Dektak-XT, stylus surface profiling system
Additional Equipment
Etching
- Wet etching bench
Metrology
- Reflective Film Thickness Measurement System (Filmetrics F40)
- Optic Microscope with camera (Nikon Eclipse L200N)
- Four-probe Resistivity Measurement Stand (Lucas 302)
Wafer Processing
- Spinner (Laurell WS-400-6NPP)
- Hot Plate (Super Nuova 120)
- Oven (Thermo Scientific 3492M)
- UltraSonic Cleaner (Brason 2510)